According to a recent report from the Okinawa Institute of Science and Technology Graduate University (OIST) published on their website, a new extreme ultraviolet (EUV) lithography technology has been developed, surpassing the existing standards in semiconductor manufacturing. This innovative design enables the lithography equipment to utilize a smaller EUV light source, consuming less than one-tenth of the power of traditional EUV lithography machines. This advancement not only reduces costs but also significantly enhances the reliability and lifespan of the machines.