Japan Installs First ASML EUV Lithography Machine, Marking a New Era in Semiconductor Manufacturing

In a groundbreaking development for the semiconductor industry, Japan’s Rapidus has successfully begun installing its first ASML EUV lithography machine, becoming the country’s first semiconductor company to adopt this cutting-edge technology. This milestone positions Japan as a serious contender in the global race for advanced chip manufacturing.

Rapidus and ASML's Collaboration on EUV Technology

On December 18, 2024, Rapidus announced the delivery and installation of an ASML TWINSCAN NXE:3800E lithography machine at its IIM-1 facility in Chitose, Hokkaido. This advanced EUV (Extreme Ultraviolet) lithography system is the first in Japan designed for mass production of state-of-the-art semiconductors, specifically tailored for 2nm manufacturing processes.

The NXE:3800E, part of ASML’s 0.33 NA EUV lithography series, offers a 37.5% improvement in wafer throughput compared to its predecessor, the NXE:3600D. The system also shares components with the next-generation 0.55 NA EUV platform, enhancing its efficiency and scalability. This acquisition is a crucial step in Rapidus' strategy to produce 2nm semiconductors, with its trial production line slated to commence operations in April 2025.

To complement the EUV lithography machine, Rapidus is also investing in additional semiconductor manufacturing and transport systems. The company plans to introduce single-wafer processes across all production equipment and establish a new foundry service, dubbed RUMS (Rapid Unified Manufacturing Service).

ASML EUV Lithography: A Game-Changer for Japan

EUV lithography is the cornerstone of next-generation semiconductor manufacturing, enabling precise patterning at smaller scales essential for 5nm and sub-5nm nodes. ASML, based in the Netherlands, is the sole provider of EUV lithography machines, which have become indispensable for high-performance chip production. With EUV technology, chipmakers can overcome the limitations of older Deep Ultraviolet (DUV) lithography systems, continuing to advance Moore's Law.

While ASML's most advanced systems have traditionally been supplied to giants like TSMC and Samsung, this collaboration with Rapidus signals Japan’s ambition to reclaim its status in the semiconductor industry. ASML is also providing technical support and training to ensure the successful implementation of this advanced technology.

Rapidus: Revitalizing Japan's Semiconductor Ambitions

Founded in 2022 as a joint venture between eight Japanese companies—including Sony, Toyota, NTT, Mitsubishi, NEC, Kioxia, and SoftBank—Rapidus aims to develop and localize advanced semiconductor manufacturing. The company signed a technology licensing agreement with IBM in late 2022 to accelerate the development of its 2nm process, with plans for mass production by 2027. Rapidus is also working on prototype chips utilizing the 2nm process, targeting completion in spring 2025.

This partnership with ASML positions Rapidus to compete with semiconductor powerhouses like TSMC and Samsung. By adopting EUV lithography, Rapidus gains the capability to produce cutting-edge chips and establish itself as a major player in the global semiconductor market.

Challenges and Future Prospects

Despite this progress, Japan faces significant challenges in rebuilding its semiconductor industry. Decades of lagging behind competitors have left gaps in technology, talent, and investment. Rapidus, while ambitious, must overcome these hurdles to achieve its goals and compete with established leaders like TSMC and Samsung.

The success of Rapidus could mark the revival of Japan’s semiconductor industry and reshape the global semiconductor landscape. As the company prepares to compete in the 2nm race, its efforts are set to play a pivotal role in determining the future balance of power in the semiconductor sector.